A precision filtration process is critical for maintaining the consistent particle size distribution, chemical stability, and ultra-high purity of polishing slurries, directly impacting wafer surface planarity and defect reduction. At LOONG Filtration, we provide semiconductor manufacturers with specialized filtration solutions that meet the stringent requirements of CMP processes, combining advanced membrane technology with contamination-control design. Whether for oxide, STI, or metal polishing applications, our systems help ensure high yield, uniform removal rates, and reliable performance in advanced node manufacturing.
